Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal-Insulator-Metal Capacitors

Highly Improved Uniformity in the Resistive Switching Parameters of TiO2 Thin Films by Inserting Ru Nanodots

Enhanced electrical properties of SrTiO(3) thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications

Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO4 Precursor

Influences of a crystalline seed layer during atomic layer deposition of SrTiO(3) thin films using Ti(O-iPr)(2)(thd)(2), Sr(thd)(2), and H(2)O

Growth of RuO2 Thin Films by Pulsed-Chemical Vapor Deposition Using RuO4 Precursor and 5% H-2 Reduction Gas

Atomic layer deposition of TiO2 and Al-doped TiO2 films on Ir substrates for ultralow leakage currents

Local Epitaxial Growth of Ru Thin Films by Atomic Layer Deposition at Low Temperature

Improvement in the leakage current characteristic of metal-insulator-metal capacitor by adopting RuO2 film as bottom electrode

Electrical properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes

Electrically Benign Dry-Etching Method for Rutile TiO2 Thin-Film Capacitors with Ru Electrodes

A theoretical model for Schottky diodes for excluding the sneak current in cross bar array resistive memory